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丹普超高真空磁控溅射镀膜机丹普超高真空磁控溅射镀膜机丹普超高真空磁控溅射镀膜机

AS400

采用无盲点镀膜技术,支点可以自动切换,双真空室,内外表面镀制TiN-GIMS,并且配置矩形和柱状磁控溅射靶和气体离子源...
  • 丹普超高真空磁控溅射镀膜机
  • 丹普超高真空磁控溅射镀膜机
  • 丹普超高真空磁控溅射镀膜机
  • Detail
Ultra High Vacuum Magnetron Sputtering equipment

1. The ultimate vacuum 5.0*10-5Pa
2. No blind spot coating technology
3. Fulcrum automatic switching technology
4. Double vacuum chamber
5. TiN-GIMS plating on inner and outer surfaces
6. Configure rectangular and cylindrical magnetron sputtering targets
7. Configure gas ion source
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